Context :
CEA-Leti designs the microelectronic components of tomorrow. This involves developing new materials for devices, as well as essential materials for integrated circuit manufacturing, such as photoresists. These innovations also aim to reduce environmental impact by creating products without PFAS or toxic substances. In this context, the Advanced Lithography Processes Laboratory (LALP) collaborates with the Materials for Sensors and Delivery Laboratory (LMCD) at CEA to co-develop new bio-based lithography resists containing methacrylate functions. The goal of the PhD is to study the performances of these new photoresists in lithography and to evaluated their environmental and economical impact. To do so, an emphasis will be made on the influence of the chemical synthesis on the optical properties of the resists, their polymerization mechanisms, and the mechanical characteristics of the resists after exposure. Finally, tools will be given to conduct life cycle analysis on the different products.
Required skills :
The study will examine the entire photolithography process: from the synthesis of the base product and its formulation, to the final structuring. An initial study will analyze the rheological properties of the material after synthesis. Next, its behavior will be evaluated during the spin-coating step (ellipsometry and TGA/DSC). An analysis will focus on the product's sensitivity to a wavelength of 365 nm. Characterization of the product will be carried out by examining the shape of the obtained patterns (SEM) and the physical properties of the resist (ellipso-porosimetry and AFM). Etching tests will also be conducted.