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Development of advanced gallium oxide (Ga2O3) on polycrystalline silicon carbide (SiC) bilayer substrate


Thesis topic details

General information

Organisation

The French Alternative Energies and Atomic Energy Commission (CEA) is a key player in research, development and innovation in four main areas :
• defence and security,
• nuclear energy (fission and fusion),
• technological research for industry,
• fundamental research in the physical sciences and life sciences.

Drawing on its widely acknowledged expertise, and thanks to its 16000 technicians, engineers, researchers and staff, the CEA actively participates in collaborative projects with a large number of academic and industrial partners.

The CEA is established in ten centers spread throughout France
  

Reference

SL-DRT-24-0727  

Direction

DRT

Thesis topic details

Category

Technological challenges

Thesis topics

Development of advanced gallium oxide (Ga2O3) on polycrystalline silicon carbide (SiC) bilayer substrates for power electronics

Contract

Thèse

Job description

Enhancing the efficiency of energy-conversion devices is a primary goal for numerous international organizations [1]. As a result, the power electronics and wide-band-gap materials industries require significant development effort to align with these objectives. Particularly, recent progress in silicon carbide (SiC) processing technologies [2]–[4] show that innovative substrate architectures have the potential to offer state-of-the art opportunities. These designs can enable us to achieve better performance while simultaneously reducing environmental impacts. With this Ph.D. subject, we propose to explore new frontiers beyond these recent developments.
The research objectives of this subject are to develop a clean room process for transferring a thin layer of Ga2O3 layer onto a polycrystalline bulk SiC substrate using the Smart Cut™ technology [5]. This architecture will allow to benefit from the exceptional ultra-wide bandgap and high breakdown electric field of the Ga2O3 material, while compensating for its low thermal conductivity with that of SiC. Numerical simulations will be developed to study the electrical and thermal conduction mechanisms across the Ga2O3/SiC interface. In parallel, the technological manufacturing of double-layer substrates in a clean room will be fine-tuned so as to be able to characterize the electrical and thermal performance of such a heterostructure. Advanced physico-chemical characterizations (TEM, Raman, SIMS, XRD, etc.) will be used to complete the global material study.
[1] European Commission, Energy, Climate change, Environment, 2022. [Online]. Available: https://energy.ec.europa.eu/topics/energy-efficiency/energy-efficiency-targets-directive-and-rules_en
[2] S. Rouchier et al., Materials Science Forum, vol. 1062, pp. 131–135, 2022, doi: 10.4028/p-mxxdef.
[3] O. Bonnin, E. Guiot, and W. Schwarzenbach, Coumpound Semiconductor Issue, vol. 27, no. VI pp. 18-22, 2021. [Online]. Available: https://compoundsemiconductor.net/magazine#y2021
[4] G. Gelineau et al., Materials Science Forum, vol. 1089, pp. 71–79, 2023, doi: 10.4028/p-026sj4.
[5] M. Bruel and B. A. Auberton-Hervé, Jpn. J. Appl. Phys., vol. 36, no. 3S, p. 1636, 1997, doi: 10.1143/JJAP.36.1636.

University / doctoral school

Electronique, Electrotechnique, Automatique, Traitement du Signal (EEATS)
Université Grenoble Alpes

Thesis topic location

Site

Grenoble

Requester

Position start date

01/10/2024

Person to be contacted by the applicant

WIDIEZ Julie julie.widiez@cea.fr
CEA
DRT/DCOS//LIFT
17 avenue des Martyrs, 38054 Grenoble Cedex 9
+33 4 38 78 41 74

Tutor / Responsible thesis director

EON David david.eon@neel.cnrs.fr
Institut Néel
UPR2940
25 rue des Martyrs, BP 166, 38042 Grenoble Cedex 9

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